MNT-HP-200-ANL Photolithography Hot Plate - Two-years Warranty - RFQ

General Introduction The MNT-HP-200-AL is an advanced version of photolithography hot plate designed for high end application requiring comprehensive multi-step temperature control. Electronic lift pins are equipped for easily loading and unloading substrates and for adjusting the distance between the hot plate surface and the wafer. This MNT-HP-200-AL features high photoresist baking speed, uniformity, high temperature control accuracy, and and highly repeatable experimental results. The MNT-HP-200-AL is also available with Nitrogen purge function and temperature ramp control as an option , MNT-HP-200-ANL.  The MNT-HP-200-AL is a perfect tool to fabricate metal oxide thin films, polymer coatings and metal organic thin films on silicon wafers or other substrates.  Because the HP-200 has a uniform temperature profile across the substrate and provides even heating to the films and coatings, it features reduced baking time, increased reproducibility, and more uniform and better film quali