MNT-HP-VG170 photolithography Hot Plate

General Introduction The MNT-HP-VG170 is a compact and easy-to-use photolithography hot plate. It is used in prebake, postbake, and hardbake of the photolithographic process. This product features high baking speed, uniformity, high temperature control accuracy, and highly repeatable experimental results. Built-in vacuum ensures close contact between wafer and heating surface. Built-in vacuum ensures close contact between wafer and heating surface. Comparing with conventional oven, using hotplate to cure the films will result in reduced baking time, increased reproducibility, and more uniform and better film quality. It is because the MNT-HP-VG170 has a uniform temperature profile across the substrate and provides even heating to the films and coatings. The skin effect will be avoided since the films/coatings are heated from bottom up. Product Features - Manual controlled vacuum function ensures close contact between wafer and heating surface- High precision temperature control with di