Plasma Cleaner MNT-PC-2 of 13.56 MHZ with Quartz Chamber, Vacuum Pump & Two-year Warranty

General Introduction MNT-PC-2 Plasma cleaner is a compact and low cost plasma cleaner which is designed for surface cleaning and surface treatment. By working with N2, Argon, Oxygen, air, or mixed gas plasma, it is widely used to clean and remove nanoscale organic contamination on wafer. The removal rate can reach about 10 nm/min at high RF power. It is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve best quality. When working with properly selected gas, it is a powerful tool from surface treatment for various materials from glass to stainless steel. The MNT-PC-2 Plasma cleaner is equipped with a Radio Frequency power source of 13.56MHZ/150W, which approves fast removal rate comparing with 40KHZ and is widely applied for scientific research and industrial applications, such as plasma cleaning, plastic bonding, plasma coating, and plasma etching. Plasma cleaning of optical parts generates super-clean surfaces by removing the thin layer