Plan APO ELWD HNA 100X Objective
Extra Long Working Distance Objectives High Numerical Aperture Constructed for optimum resolution and image clarity, the high numerical aperture extra long Plan Apochromat objective is ideal for applications requiring both working distance and a high numerical aperture. The infinity-corrected and strain-free optical system provides crisp and high-contrast images at the working distance demanded. See all available objectives Specifications Plan Apochromat ELWD Objectives HNA [High Numerical Aperture] Mag. N.A W.D (mm) F (mm) R (μm) D.F (μm) FOV (mm)(Ø24 eyepiece) FOV (VxH,mm)(1/2" chip sensor) FOV (VxH,mm) (2/3" chip sensor) Weight (g) ELWD 100X HNA 0.800 3.0 2.0 0.34 0.43 Ø 0.24 0.048X0.064 0.066X0.088 450 Valid for PA53MET-BD, PA53MET-BD-T, PSM-1000 Standard System, PSM-1000 Head only, PSM-1000E Standard System, PSM-1000E Head only Downloads Catalog