C09300 - SEMI C93 - Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System

 E This Standard was editorially modified in January 2024 to correct an error. Changes were made to ¶ 11.2.4.1. This Standard describes a Guide for analysis of virgin high-purity ion exchange (HPIX) resin suitable for use in ultrapure water (UPW) polish applications. Further information regarding UPW systems can be found in SEMI F61. The Guide focuses on analysis of HPIX resin used in UPW. This Guide recommends parameters and test conditions that will minimize the effect of contamination from the resin on the manufacturing process. The purpose of the Guide is to avoid prolonged rinse-up of the new HPIX when it is loaded into ion exchange (polish) tanks. The Guide results should be representative of full-scale applications. This Guide was developed to support the proactive quality management approach. It assumes that some of the critical trace contaminants (i.e., particles of the size of 5 to 10 nm range or low PPQ levels of metals) cannot currently be effectively measured in UPW. This