E15200 - SEMI E152 - Specification for Mechanical Features of EUV Pod for 150 mm EUVL Reticles

This Standard specifies EUV Pod for the 150 mm Extreme Ultraviolet Lithography (EUVL) reticle, used to ship, transport and store a 6-inch reticle. The EUV Pod consists of an outer pod and a protective inner pod. The EUV Pod is to be used when a conventional reticle carrier does not meet the requirements of EUVL. 　 This Standard is intended to set an appropriate level of specification that places minimal limits on innovation while ensuring modularity and their interchangeability at all mechanical interfaces. Many requirements given in this Specification are in the form of maximum or minimum dimensions with very few required surfaces. No material requirements or microcontamination limits are given in this Specification. 　 Because of high attenuation feature of EUV light, a conventional pellicle film cannot be placed in front of EUVL reticles. The inner pod is to protect reticles from particle contamination. 　 The EUV Pod has the following components and subcomponents. The baseplate of in