MF002600 - SEMI MF26 - Test Method for Determining the Orientation of a Semiconductive Single Crystal

 The orientation of semiconductor crystals and wafers as determined by these test methods is an important materials acceptance requirement because the orientation controls various parameters of semiconductor devices fabricated from the material. This Test Method covers techniques for determining the crystallographic orientation of a surface which is roughly parallel to a low-index atomic plane in single crystals used primarily for semiconductor devices. Two types of test methods are covered as follows:Test Method A, X-Ray Diffraction Orientation — This test method may be used for the orientation of all semiconductive single crystals. The X-ray test method is nondestructive and yields the more precise measurement of orientation; however, use of the equipment requires compliance with stringent safety regulations.Test Method B, Optical Orientation — This test method is limited in application at the present time to elemental semiconductors. The optical test method requires etching the spec