P03200 - SEMI P32 - Test Method for Determination of Trace Metals in Photoresist

This test method was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www.semi.org August 2004; to be published November 2004. Originally published September 1998.   NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. 　 This document describes an outline of a quantitative analysis method on trace metal concentration. This standard is intended to promote communication between users and suppliers.   This document applies to a measurement of trace metal concentration in ppb level in photoresist by instrumental techniques, such as atomic absorption spectrometry, plasma ion source mass spectrometry, and inductively cou