T01000 - SEMI T10 - Test Method for the Assessment of 2D Data Matrix Direct Mark Quality

 This Standard is intended to define the methodology for the assessment of 2D Data Matrix direct mark quality. This Standard defines assessment criteria, metrology methods, and assessment reporting procedures as applied to 2D Data Matrix code direct marks on semiconductor related materials. Application specifications, which refer to this Standard, may further limit its scope to more specific requirements of a particular application. Referenced SEMI Standards (purchase separately)None. Revision HistorySEMI T10-0701 (Reapproved 0923)SEMI T10-0701 (Reapproved 0618)SEMI T10-0701 (Reapproved 0912)SEMI T10-0701 (Reapproved 0307)SEMI T10-0701 (first published)