P01000 - SEMI P10 - Specification of Data Structures for Photomask Orders

 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. These data structure specifications are intended to facilitate the transmittal of mask order data between software systems to allow: automated order placement by mask customers and to allow the automatic processing of such orders by mask shops, and automated delivery of actual mask results and qualification data by mask shops and to allow the automatic processing of such data by mask customers.  By using these standardized structures, software written independently for either mask customers or mask shops should be able to communicate unambiguously with software written by other parties. This structure only defines the data format for the transmitted file. No particular database or programming language is specified by this Standard, except that an authorized implementation in Extensible Markup Language (XML) format will be posted on the SEMI P10 Web site for those that choose to use it. The data file is to be transmitted as a UTF-8 file. As such, it is compatible with the SECS-II standard. Referenced SEMI StandardsSEMI P1 — Specification for Hard Surface Photomask SubstratesSEMI P2 — Specification for Chrome Thin Films for Hard Surface PhotomasksSEMI P4 — Specification for Round Quartz Photomask SubstratesSEMI P5 — Specification for PelliclesSEMI P6 — Specification for Registration Marks for PhotomasksSEMI P21 — Guidelines for Precision and Accuracy Expression for Mask Writing EquipmentSEMI P22 — Guideline for Photomask Defect Classification And Size DefinitionSEMI P24 — CD Metrology ProceduresSEMI P29 — Guideline for Description of Characteristics Specific to Halftone/Attenuated Phase Shift Masks and Mask BlanksSEMI P35 — Terminology for Microlithography MetrologySEMI P37 — Specification for Extreme Ultraviolet Lithography Mask SubstratesSEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask BlanksSEMI P39 — Specification for Open Artwork System Interchange Standard (OASIS)SEMI P43 — Photomask Qualification Terminology