P02400 - SEMI P24 - CD Metrology Procedures

This standard was technically approved by the Global Micropatterning Committee and is the direct responsibility of the North American Micropatterning Committee. Current edition approved by the North American Regional Standards Committee on July 11, 2004. Initially available at www.semi.org September 2004; to be published November 2004. Originally published in 1994.   NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. 　 The purpose of this document is to establish uniform procedures for metrology systems for the litho-metrology task. It does not address how these systems will be applied to solve problems, nor does it address other contributors to process variations such as thermal wafer processing, exposure tool focus control, materials, etc.   This document discusses determining the performance of gauging/me