Aluminium Dioxide (Al2O3) PLD Target

Material Aluminium Dioxide, Alumina Formula Al2O3 Purity 99.995% Typical Substrates Glass, Silicon, Quartz, Devices, Single Crystals Related Materials SiO2, MgO   Alumina (Al2O3) is a PLD target material that is used to create thin films for a variety of applications. The colour of an Al2O3 sputtering target is typically very pure white and the films are highly transparent on deposition in thin film form. Common Uses of Alumina (Al2O3) Thin Films The most common use of Al2O3 thin films is as an electrical insulator. Al2O3 thin films are used as dielectric layers in capacitors and other electrical components due to their high dielectric constant and low electric conductivity. Al2O3 thin films are also used as diffusion barriers in multilayer integrated circuits to prevent inter-layer electrical shorts. Other applications for Al2O3 thin films include optical coatings for lenses and mirrors. Typical Materials and Substrates Al2O3 is Deposited On Epitaxial films of Al2O3