M04000 - SEMI M40 - Guide for Measurement of Roughness of Planar Surfaces on Polished Wafers

 This Guide incorporates the following methodologies: Standardized scan patterns for both local and full-area surface characterization,A set of roughness abbreviations that describe measurement conditions in a short-hand code, andReference test methodologies for three generic types of roughness measuring instruments. These general categories may include, but are not limited to:• Profilometers — AFM and other scanning probe microscopes; optical profilometers; high-resolution mechanical stylus systems,• Interferometers — Interference microscopes, and• Scatterometers — Total integrating scatterometers (TIS), angle-resolved light scatterometers (ARLS), scanning surface inspection systems (SSIS). Procedures to obtain a representative value of roughness for a surface are specified. Roughness nomenclature is intended to remove ambiguities with respect to identifying the roughness measurements used and the results achieved. Referenced SEMI Standards (purchase separately)SEMI E89 — Guide for Measurement System Analysis (MSA)SEMI HB1 — Specification for Sapphire Wafers Intended for Use for Manufacturing High Brightness-Light Emitting Diode DevicesSEMI M1 — Specification for Polished Single Crystal Silicon WafersSEMI M20 — Practice for Establishing a Wafer Coordinate SystemSEMI M50 — Test Method for Determining Capture Rate and False Count Rate for Surface Scanning Inspection Systems by the Overlay MethodSEMI M52 — Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 11 nm Technology GenerationsSEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodisperse Reference Spheres on Unpatterned Semiconductor Wafer SurfacesSEMI M58 — Test Method for Evaluating DMA Based Particle Deposition Systems and ProcessesSEMI M59 — Terminology for Silicon TechnologySEMI ME1392 — Guide for Angle Resolved Optical Scatter Measurements on Specular or Diffuse SurfacesSEMI MF1048 — Test Method for Measuring the Effective Surface Roughness of Optical Components by Total Integrated ScatteringSEMI MF1811 — Guide for Estimating the Power Spectral Density Function and Related Finish Parameters from Surface Profile Data Revision HistorySEMI M40-1114 (Reapproved 1023)SEMI M40-1114 (technical revision)SEMI M40-1109 (technical revision)SEMI M40-0200 (first published)