P01900 - SEMI P19 - Specification for Metrology Pattern Cells for Integrated Circuit Manufacture

This standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www.semi.org in June 2007. Originally published in 1992; previously published in 1996.   NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. 　 This document defines several standard test patterns to provide consistent industrywide evaluation and testing of micropatterning equipment, metrology instruments, and processes used in integrated circuit manufacturing.   This specification defines the shape, general size, and recommended placement and design rules (where appropriate) of several basic pattern cells for linewidth metrology, resolution testing, and proximity testing. These standard patterns include ce