P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks

  This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks.  　 Referenced SEMI Standards SEMI P1 — Specification for Hard Surface Photomask Substrates SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks SEMI P22 — Guideline for Photomask Defect Classification and Size Definition SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture