F06100 - SEMI F61 - Guide to Design and Operation of a Semiconductor Ultrapure Water System

This Guide should be used in conjunction with SEMI F63 and SEMI F75. Together these Guides provide recommendations for facility engineers and other manufacturing professionals who are responsible for establishing programs to monitor and control the quality of their ultrapure water (UPW) systems through to point-of-use (POU).   This Guide describes the engineering and component requirements for a UPW system used in semiconductor manufacturing. It is intended to establish a common basis for developing detailed specifications for design, operations, certification, and monitoring of UPW and hot ultrapure water (HUPW) systems. This Guide applies to advanced UPW systems used in semiconductor manufacturing facilities for supplying high purity water for wafer processing, chemical dilutions, and other facility applications. This Guide provides definitions used for identification of UPW system components and other commonly used terms associated with the semiconductor facility water systems.